Etch Tech 2012: Pushing the Limits

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Etch Tech 2012: Pushing the Limits

Etch Tech 2012: Pushing the Limits

July 16 - 17, 2012

8:30 A.M. - 4:00 P.M.

Day 1: Hameetman Auditorium - The Cahill Center
Day 2: Moore Laboratory - Room 070

Presented by: 

  • The Kavli Nanoscience Institute, California Institute of Technology 
  • Oxford Instruments

This workshop is open to all those people working in industry and academia, with an interest in recent progress in research and development, plus future trends in the fabrication and application of micro & nano structures and devices.

Topics include: Nanoscale Applications of ALD; Advances in Deep RIE / MEMS; OpSIS, Single Digit Nanoscale Fabrication; Optical and Electrical Probes; Silicon Nanowires and Novel Etch Techniques; Diamond Etching

Speakers Include:

Day 1 Talks: Hameetman Auditorium, in the Cahill Center

  • Dan Ayres Managing Director, Oxford Instruments
  • Michelle Bourke Senior Product Manager, Oxford Instruments
  • Andrei Faraon Assistant Professor or Applied Physics and Materials Science, Caltech
  • Bob Gunn Application Team Leader, Oxford Instruments Plasma Technology
  • Michael Hochberg Associate Professor, Electrical and Chemical Engineering, University of Delaware
  • Rassul Karabalin Senior Research Scientist, Condensed Matter Physics, Caltech
  • Zuweil Liu Lawrence Berkeley National Lab / Oxford Instruments
  • Deirdre Olynick Staff Scientist, Nanofabrication Facility, Lawrence Berkeley National Lab
  • Oskar Painter Professor of Applied Physics; Executive Officer for Applied Physics and Materials Science; and Co-Director, Kavli Nanoscience Institute, Caltech
  • Sameer Walavalkar Postoctoral Scholar in Physics, Caltech

Day 2 Tutorials: Moore Laboratory, room 070

  • Leslie Lea Principal Technologist, Oxford Instruments
  • Craig Ward Applications Engineer, Oxford Instruments
  • Annika Peter Technologist, Oxford Instruments